Skip to Main content Skip to Navigation
Journal articles

N2-H2 capacitively coupled radio-frequency discharges at low pressure. Part II. Modelling results: the relevance of plasma-surface interaction.

Abstract : In this work, we present the results of simulations carried out for N2-H2 capacitively coupled radio-frequency discharges, running at low pressure (0.3–0.9 mbar), low power (5–20 W), and for amounts of H2 up to 5%. Simulations are performed using a hybrid code that couples a two-dimensional time-dependent fluid module, describing the dynamics of the charged particles in the discharge, to a zero-dimensional kinetic module, that solves the Boltzmann equation and describes the production and destruction of neutral species. The model accounts for the production of several vibrationally and electronic excited states, and contains a detailed surface chemistry that includes recombination processes and the production of NHx molecules. The results obtained highlight the relevance of the interactions between plasma and surface, given the role of the secondary electron emission in the electrical parameters of the discharge and the critical importance of the surface production of ammonia to the neutral and ionic chemistry of the discharge.
Document type :
Journal articles
Complete list of metadata

Cited literature [97 references]  Display  Hide  Download

https://hal-insu.archives-ouvertes.fr/insu-02867254
Contributor : Catherine Cardon Connect in order to contact the contributor
Submitted on : Sunday, November 15, 2020 - 9:37:30 PM
Last modification on : Wednesday, May 4, 2022 - 3:48:22 AM
Long-term archiving on: : Tuesday, February 16, 2021 - 6:25:18 PM

File

20-02-10-N2-H2_model_HAL.pdf icone licence fichier
Files produced by the author(s)

Submitted version (10 February 2020)

Identifiers

Citation

Miguel Jiménez-Redondo, Audrey Chatain, Olivier Guaitella, Guy Cernogora, Nathalie Carrasco, et al.. N2-H2 capacitively coupled radio-frequency discharges at low pressure. Part II. Modelling results: the relevance of plasma-surface interaction.. Plasma Sources Science and Technology, IOP Publishing, 2020, 29 (8), pp.085023. ⟨10.1088/1361-6595/ab9b1b⟩. ⟨insu-02867254⟩

Share

Metrics

Record views

55

Files downloads

31