Atomic oxygen recombination on fused silica: modelling and comparison to low-temperature experiments (300 K)
Résumé
This work is devoted to the study of atomic oxygen recombination on a glass surface, mainly in connection with atomic sources development. In this paper we present a non-stationary model for atomic oxygen recombination on a fused silica surface. Kinetics equations for oxygen atoms, taking into account heterogeneous reactions between gaseous atoms and the surface (Eley-Rideal mechanisms), as well as homogeneous processes involving surface migration of adsorbed species (Langmuir-Hinshelwood mechanisms), are solved. Surface reaction coefficients are calculated, and the choice of numerical values for surface parameters is discussed. The solution to the equations is compared to our previous experiments concerning the influence of the surface state on atomic recombination. An estimation is made of surface reaction coefficient values.